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Plasma CVD Tools (MPCVD, PECVD, ECR-CVD)


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Group Offers into sub-categories under Plasma CVD Tools (MPCVD, PECVD, ECR-CVD)Group Offers into sub-categories under Plasma CVD Tools (MPCVD, PECVD, ECR-CVD)

List all 3 product types under Plasma CVD Tools (MPCVD, PECVD, ECR-CVD)List all 3 product types under Plasma CVD Tools (MPCVD, PECVD, ECR-CVD)
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 Offered (box) or Wanted (coins)  Item ID  Short Description Product Type / Details # Price Notes
Make Model
  $  
184607

Astex  

AX5000, AX6000, AX6350 or similar 

List all items of this typeSingle Chamber PECVD Tools

in Plasma CVD Tools (MPCVD, PECVD, ECR-CVD)

Astex AX5000 Microwave Plasma Diamond Growth System:
  • Cline Innovations has all components necessary to refurbish and reintegrate a 5kW Astex MPCVD system for R&D or limited production.
  • System can be rebuilt based on customer's application needs using a combination of reliable, new and used/refurbished components.
  • Alternatively, a kit of core components can be offered for skilled users interested in building their own system.
  • This general system type enables growth of nanocrystalline. polycrystalline, or single crystal diamond (SCD) depending on configuration and operating conditions.
  • 1.5kW to 5kW microwave power input.
  • 3 stage options: Cooled, Heated, or Thermally Floating.
  • Integration with computer controls is strongly recommended.
  • Chamber designs vary by vintage, but can be confirmed at the time of quotation.
  • Please note that the chamber shown in the attached image is a new chamber.  The most typical configuration involves the use of a used, professionally-refurbished double-jacked, water cooled chamber of the same general AX5000 design.
 1   F*
189843

Astex  

AX6500 "Clamshell" MPCVD 

List all items of this typeSingle Chamber PECVD Tools

in Plasma CVD Tools (MPCVD, PECVD, ECR-CVD)

Astex AX6500 Bottom-launch Diamond Growth System:
  • This in-stock equipment is offered for domestic sale within the USA only. 
  • Microwave Plasma CVD (MPCVD) "Clamshell" diamond deposition system designed & produced by Astex.
  • Capable of high rate single-crystal diamond (SCD) homoepitaxy as well as growth of polycrystalline, nanocrystalline (NCD or UNCD).
  • System is in the process of being refurbished with a majority of refurbishment already completed with the focus on improved purity, process control, and system safety:
    • Chamber cleaning,
    • Computer control updates,
    • Higher throughput water cooling subsystem,
    • Replacement of selected o-ring components with metal seals, and
    • Enhanced process control/monitoring devices.
  • The AX6500 employs a unique, bottom-launched microwave plasma apparatus rated for up to 8kW of 2.45GHz microwave input.
  • Top-loaded, water-cooled aluminum chamber with water-cooled stage. Copper stage is typically shielded with special fixtures during plasma processing.
  • Photo Note: System photo shown include a similar quality, similar vintage system sold in the past.  Actual photos or inspection available to qualified customers only.
 1  
137483

Astex  

ECR-MOCVD-PECVD 

List all items of this typeSingle Chamber PECVD Tools

in Plasma CVD Tools (MPCVD, PECVD, ECR-CVD)

ASTeX Large Volume Plasma Processing System (ECR-PECVD-MPCVD-MOCVD):

High density plasma system activated by ECR-enhanced, 2.45GHz microwave input offers PECVD-MOCVD deposition, functionalization, and/or dry etching of ceramics, carbon-based materials, and nanomaterials at relatively low substrate temperatures.


Computer-Controlled, low pressure, high power-density, microwave plasma system equipped with a large 28-inch dia X 51-inch long cylindrical SS chamber with full-diameter doors on each end and many ISO 150 & 250 flanges. Two Astex 2.5kW to 5KW microwave generators are used to power two permanent-magnet high-power ECR (Electron Cyclotron Resonance) sources. A planetary motion feedthrough is mounted on the top of the chamber and is equipped with RF-bias functionality (if needed) and planetary fixturing. Flexible system design is currently configured for simultaneous, high-rate, PECVD-MOCVD deposition of ceramic oxides onto many 3-D parts using gas, vapor and liquid reactants and no external heating.

Potential future uses range from large area (or large volume) PECVD (or plasma MOCVD) deposition of ceramics, semiconductors, DLC, nanodiamond, nanomaterials as well as surface treatment, functionalization and/or dry plasma etching.

This is a flexible R&D or semi-production system that was originally installed in the 1999 timeframe and used for high deposition-rate oxide PECVD/MOCVD research for less than 3-½ years. Most, if not all, of the research was focused on silicon oxide studies with rates measured in the micron/minute range using up to 10KW (2 X 5KW) of microwave power input enhanced with two ECR magnets.

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*   Vendor Role: Mfr is Manufacturer; Sup is Supplier/Distributor; OEM is Original Equipment Manufacturer

NOTE:
   photo available
   reference document attached
  F* if the item is specially featured
  N* if the item is newly added, and/or
  R* if the item's price is recently reduced.